Group Facilities
molecular beam epitaxy
We have facilities for arsenide, phosphide and nitride MBE growth.
- Two single growth chamber MBE systems
- One dual growth chamber MBE system
Optical Spectroscopy
- Cryogenic photoluminescence and micro-photoluminescence spectroscopy
- Picosecond time resolved spectroscopy (streak camera)
- Ellipsometry
- Spectrophotometer
- Micro-Raman spectroscopy
- Optical spectrum analyser
Topographical Profiling
- Two high resolution SEMs
- Atomic force microscope (AFM)
- Scanning tunnelling microscope (STM)
- Tally-step profiler
- Nomarski optical microscope
Cleanroom
- Tally-step profiler
- Wet benches
- Mask aligner
- Spin coater
- Optical microscope
- Chemical vapour deposition systems (LPCVD and PECVD)
- Reactive ion etching systems (RIE and ICP)
- Metal coaters (sputter, electron beam, and thermal)
- Thermal and infrared furnaces
- Nitrogen glovebox with attached evaporator for air sensitive sample manipulation
- Ellipsometer
Device Processing
- Wet oxidation
- UV and E-beam lithography
- Wafer dicing
- Wafer polishing
- Wedge bonder
Characterisation
- Power measurement
- Temperature dependent LIV
- Far-field measurement
- Temperature dependent high speed modulation (small and large signal)
- Photocurrent measurement
- Contact angle goniometer
- LED measurement system (total luminous flux measurements and angular dependent measurements)
- Calibrated integrating sphere for making photoluminescence quantum yield measurements
- High-resolution X-ray diffraction system for in-depth material structural characterization
Synthetic Chemistry Laboratory
- Six fume hood – four fitted with vacuum/nitrogen manifolds for handling air sensitive materials
- Four rotary evaporators fitted with diaphragm pumps
- Equipment for a wide range of synthetic procedures (air sensitive work, polymerisations, metal catalysed reactions, low temperature reactions, etc.)
- Well equipped for material purification (chromatography, sublimations, distillations, centrifugation)
- Dedicated glove box for manipulation of air sensitive materials
- Tube furnace: allows heating up to 1100ºC
- CEM S-Class microwave for microwave assisted chemical synthesis
Analytical Chemistry Laboratory
Laboratory dedicated to the characterisation of new materials.
Analytical equipment includes:
- High pressure liquid chromatography (HPLC)
- Gas chromatography (GC)
- Size exclusion chromatography (SEC of GPC)
- 300MHz nuclear magnetic resonance (NMR) spectrometer
- Differential scanning calorimeter (DSC)
- UV-Vis spectrometer
- Fluorescence spectrometer
- Fourier transform infra-red spectrometer
- Cyclic voltammetry
modelling and simulation
We use numerous computer-based tools to model optical systems and simulate optoelectronic device operation:
- Zemax
- LightTools
- TracePro
- Silense
- FDTD
- ASAP
- SolidWorks
- Comsol
- SpecLED
- TCAD Sentaurus
